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EEE 549

Nanoscale Fabrication Technologies for Semiconductors

Nanoscale fabrication methods used for semiconductor devices and VLSI technology. Review of Semiconductor Technology, Review of Semiconductor Device Physics, Outline of a nanoscale CMOS fabrication process, Crystal Growth, Semiconductor Manufacturing, Cleanrooms and wafer cleaning, Nanolithography, Oxidation, Diffusion, Ion Implantation, Thin film deposition, Etching, and Backend technology.

Credit3
ECTS5
BölümElectrical and Electronics Engineering
FacultyFaculty of Engineering

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↑ konuya EEE 549 yaz

Geçmiş GPA dağılımı 14 dönem · ort. 3.55

DönemCourse CPA
2025-2026 Fall 3.43 1 sec · 23 öğr
2023-2024 Spring 3.94 1 sec · 11 öğr
2021-2022 Spring 3.13 1 sec · 13 öğr
2019-2020 Spring 3.90 1 sec · 9 öğr
2017-2018 Spring 3.67 1 sec · 8 öğr
2016-2017 Fall 3.52 1 sec · 11 öğr
2015-2016 Fall 3.51 1 sec · 10 öğr
2014-2015 Fall 3.59 1 sec · 10 öğr
2013-2014 Fall 3.34 1 sec · 9 öğr
2012-2013 Fall 3.77 1 sec · 11 öğr

Aggregate course GPA — Bilkent STARS'tan public data. Hoca-bazlı per-section detayı için STARS evaluation report →. Öğrenci anket cevapları KVKK kapsamında defter'de tutulmaz.

Müfredat detayı STARS syllabus

📚 Önerilen kaynaklar

  • Önerilen Silicon VLSI Technology: Fundamentals Practice, and Modeling · James D. Plummer · Michael Deal
  • Önerilen Semiconductor Devices: Physics and Technology Simon M. Sze, Ming-Kwei Lee · 2012 · Wiley

⚖️ Değerlendirme

  • 15% — Midterm:Open-Book: Midterm 1 (×1)
  • 15% — Midterm:Open-Book: Midterm 2 (×1)

⚠️ FZ engelleyen şartlar

Minimum 75% attendance is required to qualify for the final exam (Tentative).

📅 Haftalık müfredat

Review of Nanoscale Semiconductor Technology Review of Semiconductor Device Physics-1 Review of Semiconductor Device Physics-2 Outline of a general nanoscale CMOS fabrication process Nanoscale crystal growth methods and wafer fabrication Semiconductor manufac. at the nanoscale, clean rooms, wafer cleaning Photolithography Oxidation Nanolithography Diffusion Ion implantation Nanofilm deposition Project Presentations Etching technologies Backend technology Nanocarbon technologies: Graphene and carbon nanotubes Spintronics and other nanotransistor technologies ECTS - Workload Table: Activities Number Hours Workload Final exam 1 3 3 Preparation for Quiz 5 5 25 Project (including preparation and presentation if applicable) 1 50 50 Preparation for Final exam 1 25 25 Quiz 5 1 5 Course hours 14 3 42 Total Workload: 150 Total Workload / 30: 150 / 30 5 ECTS Credits of the Course: 5 Type of Course: Lecture Course Material: PP - Written Teaching Methods: Lecture - Assignment - Exercises - Presentations - Practical session